ZrO2 thin films deposited on various LiB3O5 substrates by electron beam evaporation

Tianya Tan; Jianbing Huang; Meiqiong Zhan; Guanglei Tian; Jianda Shao; Zhengxiu Fan

doi:10.1117/12.607801

8 December 2004 ZrO₂ thin films deposited on various LiB₃O₅ substrates by electron beam evaporation

Tianya Tan, Jianbing Huang, Meiqiong Zhan, Guanglei Tian, Jianda Shao, Zhengxiu Fan

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607801
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

ZrO₂ thin films were deposited using an electron beam evaporation technique on two kinds of LiB₃O₅ (LBO) substrates having the surfaces prepared by cutting at specified crystalline orientations. The results tested by the spectrophotometer indicated that all films had optical anisotropy, which was attributed to the film microstructure with preferred orientation from GXRD (grazing X-ray diffraction) analysis. The film microstructure difference deposited on LBO substrates with different crystalline orientation resulted in film refractive index change, namely, the ZrO₂ thin film with the m-(-212) preferred orientation had lower refractive index than that with the o-(130) preferred orientation.

Citation Download Citation

Tianya Tan, Jianbing Huang, Meiqiong Zhan, Guanglei Tian, Jianda Shao, and Zhengxiu Fan "ZrO₂ thin films deposited on various LiB₃O₅ substrates by electron beam evaporation", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607801

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KEYWORDS

Thin films

Refractive index

Transmittance

Thin film deposition

Crystals

Electron beams

Thin film coatings

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