Dense OPC for 65nm and below

Nicolas B. Cobb; Yuri Granik

doi:10.1117/12.633756

9 November 2005 Dense OPC for 65nm and below

Nicolas B. Cobb, Yuri Granik

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599259 (2005) https://doi.org/10.1117/12.633756
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

In this paper, we evaluate the use of dense pixel-based simulation for OPC corrections at 65nm and below. Dense OPC can be performed in one of two "domains": (1) pixel domain or (2) edge domain. We describe the difference between these two domains and describe techniques which are suitable for those domains. The use of fast contour based OPC verification is critical to determine which OPC techniques perform best.

Citation Download Citation

Nicolas B. Cobb and Yuri Granik "Dense OPC for 65nm and below", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599259 (9 November 2005); https://doi.org/10.1117/12.633756

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