An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks

C. H. Zhang; C. C. Ji; J. G. Shi; S. Katsuki; A. Kimura; H. Fukumoto; H. Akiyama

doi:10.1117/12.674192

9 June 2006 An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks

C. H. Zhang, C. C. Ji, J. G. Shi, S. Katsuki, A. Kimura, H. Fukumoto, H. Akiyama

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Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 614905 (2006) https://doi.org/10.1117/12.674192
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

Non-equilibrium ionization plays a critical role in Z-pinch gas discharge produced plasma (GDPP) EUV source. However, the physics of the processes, plasma and surface discharges produced, magneto-hydrodynamic, photon radiation transport, and plasma-electrode interactions, which lead to EUV emission, is intrinsically complex. Many simplifying assumption are inevitable with numerical simulations, resulting in low-credibility outcomes. With the learning and generalization abilities, artificial neural networks (ANN) have been applied to model and optimize a Z-pinch plasma source, which is characterized with a experimental design at varied operational parameters including electric power input, applied voltage/current, pulse repetition, MPC parameters, electrode geometry, xenon flow rate as well as convention efficiency, EUV source size, radiation power etc.

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C. H. Zhang, C. C. Ji, J. G. Shi, S. Katsuki, A. Kimura, H. Fukumoto, and H. Akiyama "An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 614905 (9 June 2006); https://doi.org/10.1117/12.674192

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KEYWORDS

Extreme ultraviolet

Plasma

Neurons

Artificial neural networks

Xenon

Extreme ultraviolet lithography

Electrodes

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