Study of the effect of amine additives on LWR and LER

Francis M. Houlihan; David Rentkiewicz; Guanyang Lin; Dalil Rahman; Douglas Mackenzie; Allen Timko; Takanori Kudo; Clement Anyadiegwu; Muthiah Thiyagarajan; Simon Chiu; Andrew Romano; Ralph R. Dammel; Munirathna Padmanaban

doi:10.1117/12.659465

29 March 2006 Study of the effect of amine additives on LWR and LER

Francis M. Houlihan, David Rentkiewicz, Guanyang Lin, Dalil Rahman, Douglas Mackenzie, Allen Timko, Takanori Kudo, Clement Anyadiegwu, Muthiah Thiyagarajan, Simon Chiu, Andrew Romano, Ralph R. Dammel, Munirathna Padmanaban

Author Affiliations +

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 615317 (2006) https://doi.org/10.1117/12.659465
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We will give an account of our investigation on structure property relationships of amines with regards to line width roughness (LWR) and line edge roughness (LER) of a 193 nm alicyclic-acrylate resist. Specifically, we have looked at basicity, molar volume and logD as factors which may have an influence of roughness of 80 nm 1:1 L/S features. For relatively hydrophobic amines (Log D > -1), the lower the hydrophilicity at acidic pH the greater the LER and LWR becomes. Specifically, in this range of Log D, more hydrophobic larger amines, with higher basicity, tend to give worse L/S feature roughness. For amines which are more hydrophilic, the relationship becomes more complex with some amines giving a lower LER while others do not. This appears to be predicated on a delicate balance between basicity, hydrophilicy and size.

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Francis M. Houlihan, David Rentkiewicz, Guanyang Lin, Dalil Rahman, Douglas Mackenzie, Allen Timko, Takanori Kudo, Clement Anyadiegwu, Muthiah Thiyagarajan, Simon Chiu, Andrew Romano, Ralph R. Dammel, and Munirathna Padmanaban "Study of the effect of amine additives on LWR and LER", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615317 (29 March 2006); https://doi.org/10.1117/12.659465

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