Design for manufacturability production management activity report

Norihiko Miyazaki; T. Sato; M. Honma; N. Yoshioka; K. Hosono; T. Onodera; H. Itoh; H. Suzuki; T. Uga; K. Kadota; N. Iriki

doi:10.1117/12.681729

20 May 2006 Design for manufacturability production management activity report

Norihiko Miyazaki, T. Sato, M. Honma, N. Yoshioka, K. Hosono, T. Onodera, H. Itoh, H. Suzuki, T. Uga, K. Kadota, N. Iriki

Author Affiliations +

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 628302 (2006) https://doi.org/10.1117/12.681729
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Design For Manufacturability Production Management (DFM-PM) Subcommittee has been started in succession to Reticle Management Subcommittee (RMS) in Semiconductor Manufacturing Technology Committee for Japan (SMTCJ) from 2005. Our activity focuses on the SoC (System On Chip) Business, and it pursues the improvement of communication in manufacturing technique. The first theme of activity is the investigation and examination of the new trends about production (manufacturer) technology and related information, and proposals of business solution. The second theme is the standardization activity about manufacture technology and the cooperation with related semiconductors' organizations. And the third theme is holding workshop and support for promotion and spread of the standardization technology throughout semiconductor companies. We expand a range of scope from design technology to wafer pattern reliability and we will propose the competition domain, the collaboration area and the standardization technology on DFM. Furthermore, we will be able to make up a SoC business model as the 45nm node technology beyond manufacturing platform in cooperating with the design information and the production information by utilizing EDA technology.

Citation Download Citation

Norihiko Miyazaki, T. Sato, M. Honma, N. Yoshioka, K. Hosono, T. Onodera, H. Itoh, H. Suzuki, T. Uga, K. Kadota, and N. Iriki "Design for manufacturability production management activity report", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628302 (20 May 2006); https://doi.org/10.1117/12.681729

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Design for manufacturing

Photomasks

Manufacturing

Design for manufacturability

Reticles

Standards development

Inspection

Show All Keywords

Keywords/Phrases

Search In:

Publication Years