Paper
8 January 2007 Grooved infrared polarizers with a reduced reflectance
Author Affiliations +
Proceedings Volume 6414, Smart Structures, Devices, and Systems III; 64141V (2007) https://doi.org/10.1117/12.695729
Event: SPIE Smart Materials, Nano- and Micro-Smart Systems, 2006, Adelaide, Australia
Abstract
We fabricated an infrared wire-grid polarizer that was made of a tungsten silicide (WSi) grating on a Si substrate. The photolithography by the use of the two-beam interference was conducted for generating the short-period grating structure. This photoresist pattern was used as a mask for the reactive ion etching of the WSi coating and the Si substrate. Consequently, we could fabricate the WSi/Si grating with 400-nm period and 550-nm depth that acted as a wire-grid polarizer. The transmittance of TM polarization was 58% at 4-μm wavelength, which exceeded the theoretical transmittance of Si (54%). This enhancement of the transmittance was caused by the reduction in the reflectance due to the subwavelength-grating structure. The extinction ratio at 2.7-μm wavelength was 20 dB. We also measured the extinction coefficient κ of WSi, and verified that WSi was a suitable polarizing material in the mid-infrared range.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Itsunari Yamada, Junji Nishii, and Mitsunori Saito "Grooved infrared polarizers with a reduced reflectance", Proc. SPIE 6414, Smart Structures, Devices, and Systems III, 64141V (8 January 2007); https://doi.org/10.1117/12.695729
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Cited by 7 scholarly publications.
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KEYWORDS
Polarizers

Silicon

Refractive index

Transmittance

Infrared radiation

Polarization

Absorption

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