Demolding strategy to improve the hot embossing throughput

Tanguy Leveder; Stefan Landis; Laurent Davoust; Sebastien Soulan; Nicolas Chaix

doi:10.1117/12.711151

15 March 2007 Demolding strategy to improve the hot embossing throughput

Tanguy Leveder, Stefan Landis, Laurent Davoust, Sebastien Soulan, Nicolas Chaix

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65170N (2007) https://doi.org/10.1117/12.711151
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Hot embossing throughput is a key issue, which has been addressed in this paper. We show how it is possible to remove the mold from the imprinted resist at the imprint temperature. We study reflow behavior of imprinted patterns, and make a cooling and quenching simulation. This work can lead to design of cooling tools adapted to a given application, and suits as well for the full wafer imprint, as well for the roll imprint.

Citation Download Citation

Tanguy Leveder, Stefan Landis, Laurent Davoust, Sebastien Soulan, and Nicolas Chaix "Demolding strategy to improve the hot embossing throughput", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170N (15 March 2007); https://doi.org/10.1117/12.711151

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