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A simple empirical model is presented that predicts the index of refraction at 589 nm (D-line) and 193 nm for molecules based solely on chemical structure. The model was built by comparing literature values of refractive indices (sodium D-line 589 nm) of compounds with representative functionalities and has 18 adjustable parameters. Published values for nD and n193 were used to extrapolate the predictions from values of nD to values of n193. These simple, accessible models can be run using only Excel software on a laptop computer.
Robert L. Brainard,Seth Kruger, andEric Block
"Models for predicting the index of refraction of compounds at 193
and 589-nm", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651920 (22 March 2007); https://doi.org/10.1117/12.712431
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Robert L. Brainard, Seth Kruger, Eric Block, "Models for predicting the index of refraction of compounds at 193 and 589 nm," Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651920 (22 March 2007); https://doi.org/10.1117/12.712431