Paper
13 June 2007 Noise in atomic force microscopy images
P. S. Timashev, N. A. Aksenova, A. B. Solovieva, S. F. Timashev
Author Affiliations +
Proceedings Volume 6603, Noise and Fluctuations in Photonics, Quantum Optics, and Communications; 660322 (2007) https://doi.org/10.1117/12.724570
Event: SPIE Fourth International Symposium on Fluctuations and Noise, 2007, Florence, Italy
Abstract
Atomic Force Microscopy (AFM) gives a possibility to study and control the surface structure at submicron spatial scales. The essential problem in studying the surfaces is their adequate parameterization. It is necessary to extract information from the surface roughness profiles h(x) and h(y) along coordinates x and y. These profiles contain regular (resonant) components as well as chaotic (noisy) components with "long memory". The main questions are how to extract useful information about the surface state and study the effect of various external factors on it by analyzing the spatial series h(x) and h(y) and separate out the information contents of chaotic and resonant components. These problems can be solved by using Flicker-Noise Spectroscopy (FNS) approach. According to FNS, the information hidden in chaotic surface profiles is represented by correlation links in sequences of different types of irregularities: spikes, jumps, and discontinuities in derivatives of different orders at all spatial hierarchical levels of the systems. In this paper, the FNS is used to parameterize AFM images of sufficiently homogeneous structures obtained for surfaces of lithium fluoride single crystals as well as two dendritic (treelike) structures formed on mica surface from solutions of surfactant copolymers.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. S. Timashev, N. A. Aksenova, A. B. Solovieva, and S. F. Timashev "Noise in atomic force microscopy images", Proc. SPIE 6603, Noise and Fluctuations in Photonics, Quantum Optics, and Communications, 660322 (13 June 2007); https://doi.org/10.1117/12.724570
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Atomic force microscopy

Crystals

Stochastic processes

Chromium

Mica

Oxides

Lithium

Back to Top