Paper
5 March 2007 CuBr laser treatment of titanium wafers
I. Balchev, N. Minkovski, P. Stefanov, M. Shipochka, N. Sabotinov
Author Affiliations +
Proceedings Volume 6604, 14th International School on Quantum Electronics: Laser Physics and Applications; 66040X (2007) https://doi.org/10.1117/12.726986
Event: 14th International School on Quantum Electronics: Laser Physics and Applications, 2006, Sunny Beach, Bulgaria
Abstract
The use of lasers in materials processing is an increasingly attractive choice for high technology manufacturing. Factors influencing the laser ablation process include laser beam parameters, such as wavelength, energy or fluence and pulse length, the material properties of the target, such as melting temperature, thermal diffusion rate, optical reflectivity, and the ambient gas. We investigated the influence of laser treatment on titanium wafers with CuBr laser (&lgr;=511nm) by scanning laser beam with distance between paths 20&mgr;. The laser fluence varied from 4.7 J cm-2 to 13.5 J cm-2 and the laser beam scanning velocity from 25mm/s to 100mm/s with duration of 30 ns. The experiments were done in two kinds of ambient atmosphere: air and argon. The morphology of the irradiated surface was studied by scanning electron microscopy (SEM). SEM study showed that the laser irradiation caused a change in the surface morphology due to the processes of melting and subsequent resolidification as well as particle deposition from the vapor plume. The chemical state and composition of the irradiated titanium surface were determined using the Ti2p and O1s binding energy values and O/Ti intensity ratio. The XPS results indicated that on the irradiated titanium surface is formed oxide layer with stoichiometry close to TiO2. It was found that the ambient atmosphere is responsible for the change in the microstructure and chemical state of the titanium target.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. Balchev, N. Minkovski, P. Stefanov, M. Shipochka, and N. Sabotinov "CuBr laser treatment of titanium wafers", Proc. SPIE 6604, 14th International School on Quantum Electronics: Laser Physics and Applications, 66040X (5 March 2007); https://doi.org/10.1117/12.726986
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Titanium

Argon

Scanning electron microscopy

Semiconducting wafers

Atmospheric particles

Oxides

Laser irradiation

Back to Top