Numerical simulation tool for synthetic speckle pattern images and their intensity-based integration under variable conditions for metrology applications

Falko Riechert; Georg Bastian; Uli Lemmer

doi:10.1117/12.726033

18 June 2007 Numerical simulation tool for synthetic speckle pattern images and their intensity-based integration under variable conditions for metrology applications

Falko Riechert, Georg Bastian, Uli Lemmer

Author Affiliations +

Proceedings Volume 6617, Modeling Aspects in Optical Metrology; 661709 (2007) https://doi.org/10.1117/12.726033
Event: Optical Metrology, 2007, Munich, Germany

Abstract

In many metrological applications speckle can be used to determine surface properties where several complex effects and parameters are of concern. However, an analytical modelling of the decorrelation of speckle patterns created e.g. by two wavelength illumination of a surface is possible only for Gaussian-distributed surface height values and in illumination regimes where the separation of the two illumination wavelengths is much smaller than the mean value of the two wavelengths. Depending on the fabrication process of the illuminated surface the statistical distribution of the surface height values can differ significantly from a Gaussian distribution. We present a numerical simulation tool for the synthetic generation of laser-speckle patterns which a non-imaging observer (e.g. a bare CCD-chip) detects in the farfield of an illuminated surface. We investigate for which illumination wavelengths separation the analytical model is valid with a centre wavelength of 650 nm and compare simulated speckle images originating from surfaces with equal- and Gaussian-distributed height values under two-wavelength illumination. We show which differences from the analytical model for the correlation of the two emerging speckle images occur and consider the implications for an experimental situation.

Citation Download Citation

Falko Riechert, Georg Bastian, and Uli Lemmer "Numerical simulation tool for synthetic speckle pattern images and their intensity-based integration under variable conditions for metrology applications", Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661709 (18 June 2007); https://doi.org/10.1117/12.726033

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available