Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa; Hidekazu Mimura; Satoshi Matsuyama; Hirokatsu Yumoto; Takashi Kimura; Yasuhisa Sano; Kenji Tamasaku; Yoshinori Nishino; Makina Yabashi; Tetsuya Ishikawa; Kazuto Yamauchi

doi:10.1117/12.733749

1 October 2007 Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Author Affiliations +

Proceedings Volume 6704, Advances in Metrology for X-Ray and EUV Optics II; 670404 (2007) https://doi.org/10.1117/12.733749
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

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Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Hard x-ray wavefront measurement and control for hard x-ray nanofocusing", Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670404 (1 October 2007); https://doi.org/10.1117/12.733749

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KEYWORDS

Mirrors

Wavefronts

Hard x-rays

X-rays

Platinum

Metrology

Sputter deposition

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