Effect of working pressure on the properties of Al2O3/MgF2 HR coatings prepared by electron beam evaporation

Meiqiong Zhan; Zhonglin Wu; Jianda Shao

doi:10.1117/12.792014

11 March 2008 Effect of working pressure on the properties of Al₂O₃/MgF₂ HR coatings prepared by electron beam evaporation

Meiqiong Zhan, Zhonglin Wu, Jianda Shao

Author Affiliations +

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 698422 (2008) https://doi.org/10.1117/12.792014
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

The effects of working pressure on the properties of 355nm Al₂O₃/MgF₂ HR coatings were investigated. A series of samples were deposited by electron beam evaporation using the same deposition process at different working pressure. Transmittance of the HR coatings was measured by Lambda 900 spectrometer. Structure of the samples had been characterized by X-ray diffraction (XRD).The stress was measured by viewing the substrate deformation before and after coatings deposition using an optical interferometer, the stress results range from 223MPa to 315MPa. Laser-induced damage threshold (LIDT) was measured by a 351 nm Nd:YAG laser with a pulse width of 7 ns, the LIDT results range from 2.69 J/cm² to 11.03 J/cm² with the working pressure changing. It was found that working pressure has important effects on the absorption, stress and LIDT of 355nm Al₂O₃/MgF₂ HR coatings. (351nm, 7ns).The working pressure was no clear effect on the crystalline structure of the HR coatings.

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Meiqiong Zhan, Zhonglin Wu, and Jianda Shao "Effect of working pressure on the properties of Al₂O₃/MgF₂ HR coatings prepared by electron beam evaporation", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698422 (11 March 2008); https://doi.org/10.1117/12.792014

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