Profilometric characterization of DOEs with continuous microrelief

V. P. Korolkov; S. V. Ostapenko; R. V. Shimansky

doi:10.1117/12.797673

25 September 2008 Profilometric characterization of DOEs with continuous microrelief

V. P. Korolkov, S. V. Ostapenko, R. V. Shimansky

Proceedings Volume 7102, Optical Fabrication, Testing, and Metrology III; 710209 (2008) https://doi.org/10.1117/12.797673
Event: Optical Systems Design, 2008, Glasgow, Scotland, United Kingdom

Abstract

Methodology of local characterization of continuous-relief diffractive optical elements has been discussed. The local profile depth can be evaluated using "approximated depth" defined without taking a profile near diffractive zone boundaries into account. Several methods to estimate the approximated depth have been offered.

Citation Download Citation

V. P. Korolkov, S. V. Ostapenko, and R. V. Shimansky "Profilometric characterization of DOEs with continuous microrelief", Proc. SPIE 7102, Optical Fabrication, Testing, and Metrology III, 710209 (25 September 2008); https://doi.org/10.1117/12.797673

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