Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide

K. Ghoumid; R. Ferriere; B.-E. Benkelfat; G. Ulliac; R. Salut; J.-Y. Rauch; T. Gharbi

doi:10.1117/12.839692

4 August 2009 Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO₃ waveguide

K. Ghoumid, R. Ferriere, B.-E. Benkelfat, G. Ulliac, R. Salut, J.-Y. Rauch, T. Gharbi

Proceedings Volume 7386, Photonics North 2009; 738613 (2009) https://doi.org/10.1117/12.839692
Event: Photonics North 2009, 2009, Quebec, Canada

Abstract

In this paper we have studied effect of depth etching on the Bragg gratings (BGs) realized by Focused Ions Beam. This technique has the advantage to induce a direct waveguide structuring without intermediate media, comparing to traditional methods. A reflectivity of 96% within a window centred at 1550 nm is obtained. The effect of the depth etching on the transmittance and the bandwidth at half maximum is demonstrated.

Citation Download Citation

K. Ghoumid, R. Ferriere, B.-E. Benkelfat, G. Ulliac, R. Salut, J.-Y. Rauch, and T. Gharbi "Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO₃ waveguide", Proc. SPIE 7386, Photonics North 2009, 738613 (4 August 2009); https://doi.org/10.1117/12.839692

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