Align-and-shine photolithography

Audrius Petrusis; Jan H. Rector; Kristen Smith; Sven de Man; Davide Iannuzzi

doi:10.1117/12.834240

5 October 2009 Align-and-shine photolithography

Audrius Petrusis, Jan H. Rector, Kristen Smith, Sven de Man, Davide Iannuzzi

Proceedings Volume 7503, 20th International Conference on Optical Fibre Sensors; 75036Q (2009) https://doi.org/10.1117/12.834240
Event: 20th International Conference on Optical Fibre Sensors, 2009, Edinburgh, United Kingdom

Abstract

At the beginning of 2009, our group has introduced a new technique that allows fabrication of photolithographic patterns on the cleaved end of an optical fibre: the align-and-shine photolithography technique (see A. Petrušis et al., "The align-and-shine technique for series production of photolithography patterns on optical fibres", J. Micromech. Microeng. 19, 047001, 2009). Align-and-shine photolithography combines standard optical lithography with imagebased active fibre alignment processes. The technique adapts well to series production, opening the way to batch fabrication of fibre-top devices (D. Iannuzzi et al., "Monolithic fibre-top cantilever for critical environments and standard applications", Appl. Phys. Lett. 88, 053501, 2006) and all other devices that rely on suitable machining of engineered parts on the tip of a fibre. In this paper we review our results and briefly discuss its potential applications.

Citation Download Citation

Audrius Petrusis, Jan H. Rector, Kristen Smith, Sven de Man, and Davide Iannuzzi "Align-and-shine photolithography", Proc. SPIE 7503, 20th International Conference on Optical Fibre Sensors, 75036Q (5 October 2009); https://doi.org/10.1117/12.834240

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