Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology

Reyhaneh Jannesari; Iris Bergmair; Saeid Zamiri; Kurt Hingerl

doi:10.1117/12.848497

9 April 2010 Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology

Reyhaneh Jannesari, Iris Bergmair, Saeid Zamiri, Kurt Hingerl

Proceedings Volume 7643, Active and Passive Smart Structures and Integrated Systems 2010; 76431X (2010) https://doi.org/10.1117/12.848497
Event: SPIE Smart Structures and Materials + Nondestructive Evaluation and Health Monitoring, 2010, San Diego, California, United States

Abstract

We report on using e-beam lithographically technology for enabling the mass replication of custom-designed and prepared Nano-structures via establishing nanoimprint processes for pattern transfer into UV curable prepolymes. By EBL, the new nano-fabrication technology based on the concept of disposal master technology (DMT) is suitable for mass volume manufacturing of large area arrays of sub-wavelength photonic elements. We will present some kinds of PhC and waveguides for fabrication of nanoimprint Electron beam lithography stamps.

Citation Download Citation

Reyhaneh Jannesari, Iris Bergmair, Saeid Zamiri, and Kurt Hingerl "Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology", Proc. SPIE 7643, Active and Passive Smart Structures and Integrated Systems 2010, 76431X (9 April 2010); https://doi.org/10.1117/12.848497

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