Properties of AlF3 and LaF3 films at 193nm

Chunrong Xue; Jianda Shao

doi:10.1117/12.866137

6 October 2010 Properties of AlF₃ and LaF₃ films at 193nm

Chunrong Xue, Jianda Shao

Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 76553G (2010) https://doi.org/10.1117/12.866137
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

In order to develop low loss, high-performance 193nm Fluoride HR mirrors and anti-reflection coatings, LaF₃ and AlF₃ materials, used for a single-layer coating, were deposited by a molybdenum boat evaporation process. Various microstructures that formed under different substrate temperatures and with deposition rates were investigated. The relation between these microstructures (including cross section morphology, surface roughness and crystalline structure), the optical properties (including refractive index and optical loss) and mechanical properties (stress) were investigated. Furthermore, AlF₃ used as a low-index material and LaF₃ used as a high-index material were designed and deposited for multilayer coatings. Transmittance, reflectance, stress, and the laser-induced damage threshold (LIDT) were studied. It is shown that AlF₃ and LaF₃ thin films, deposited on the substrate at a temperature of 300 °C, obtained good quality thin films with high transmittance and little optical loss at 193 nm. For multilayer coatings, the absorption mainly comes from LaF₃. Based on these studies, The thickness of 193nm films was controled by a 1/3 baffle with pre-coating technology. the LaF₃/AlF₃ AR coantings and HR mirrors at 193nm were designed and deposited. Under the present experimental conditions, the reflectance of LaF₃/AlF₃ HR mirror is up to 96%, and its transmittance is 1.5%. the LaF₃/AlF₃ AR coanting's residual reflectance is less than 0.14%, and single-sided transmittance is 93.85%. To get a high-performance 193nm AR coating, super-polished substrate is the best choice.

Citation Download Citation

Chunrong Xue and Jianda Shao "Properties of AlF₃ and LaF₃ films at 193nm", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76553G (6 October 2010); https://doi.org/10.1117/12.866137

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