Challenges for quality 15nm groove patterning with ZEP520A for a master fabrication for track pitch 50nm full-surface DTR-Media

Hiromasa Iyama; Kazuhiro Hamamoto; Shuji Kishimoto; Masasuke Nakano; Takeshi Kagatsume; Takashi Sato; Hideo Kobayashi; Tsuyoshi Watanabe

doi:10.1117/12.869098

27 May 2010 Challenges for quality 15nm groove patterning with ZEP520A for a master fabrication for track pitch 50nm full-surface DTR-Media

Hiromasa Iyama, Kazuhiro Hamamoto, Shuji Kishimoto, Masasuke Nakano, Takeshi Kagatsume, Takashi Sato, Hideo Kobayashi, Tsuyoshi Watanabe

Author Affiliations +

Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481Z (2010) https://doi.org/10.1117/12.869098
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan

Abstract

Discrete Track Recording Media (DTR-Media) requires 50nm track pitch patterns and a mold as the start for 1 Tb/inch² areal density, which is a quality 15nm groove (trench) and beyond. Last year, 14nm groove was achieved with a newly designed solvent developer for ZEP520A, we reported in PMJ 2009. But, we still need to pursue extreme high resolution such as 10nm groove or 12.5nm dot array for bit patterns with ZEP520A since no alternative was found so far. To improve ZEP520 resolution, we just keep trying to find a new developer with a lower development speed for ZEP520 than the previous one. Then, a Fluoro-Carbon was selected from various candidates. It was proved that ZEP520 and the Fluoro-Carbon developer provided 11nm groove resolution at an exposure dose of 1800μC/cm². Furthermore, the mixture of the Fluoro-Carbon and Solvent B provided the same 11nm groove resolution at a higher sensitive, i.e. less exposure dose than the Fluoro-Carbon and even the Solvent B.

Citation Download Citation

Hiromasa Iyama, Kazuhiro Hamamoto, Shuji Kishimoto, Masasuke Nakano, Takeshi Kagatsume, Takashi Sato, Hideo Kobayashi, and Tsuyoshi Watanabe "Challenges for quality 15nm groove patterning with ZEP520A for a master fabrication for track pitch 50nm full-surface DTR-Media", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481Z (27 May 2010); https://doi.org/10.1117/12.869098

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