PROCEEDINGS VOLUME 7985
27TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | 18-19 JANUARY 2011
27th European Mask and Lithography Conference
Editor Affiliations +
IN THIS VOLUME

11 Sessions, 33 Papers, 0 Presentations, 0 Posters
EUV Mask I  (4)
Metrology  (5)
EUV Mask II  (4)
27TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE
18-19 January 2011
Dresden, Germany
Front Matter: Volume 7985
Proceedings Volume 27th European Mask and Lithography Conference, 798501 (2011) https://doi.org/10.1117/12.896261
Plenary Session
Proceedings Volume 27th European Mask and Lithography Conference, 798502 (2011) https://doi.org/10.1117/12.896880
E-Beam Patterning
Proceedings Volume 27th European Mask and Lithography Conference, 798503 (2011) https://doi.org/10.1117/12.881929
Juergen Gramss, Ulf Weidenmueller, Arnd Stoeckel, Renate Jaritz, Hans-Joachim Doering, Monika Boettcher
Proceedings Volume 27th European Mask and Lithography Conference, 798504 (2011) https://doi.org/10.1117/12.896883
NGL Lithography and Masks
Naoya Hayashi, Tsukasa Abe, Takeya Shimomura, Yuichi Inazuki, Tadahiko Takikawa, Hiroshi Mohri
Proceedings Volume 27th European Mask and Lithography Conference, 798505 (2011) https://doi.org/10.1117/12.896886
Khalid Dhima, Christian Steinberg, Saskia Möllenbeck, Andre Mayer, Hella-Christin Scheer
Proceedings Volume 27th European Mask and Lithography Conference, 798506 (2011) https://doi.org/10.1117/12.882805
Wafer Patterning and Application
Proceedings Volume 27th European Mask and Lithography Conference, 798507 (2011) https://doi.org/10.1117/12.885690
J. Bauer, P. Kulse, U. Haak, G. Old, G. Scheuring, St. Döbereiner, F. Hillmann, H.-J. Brück, M. Kaynak, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 798508 (2011) https://doi.org/10.1117/12.882825
EUV Mask I
Patrick Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth A. Goldberg, Gideon Jones, Brittany McClinton, Ryan Miyakawa, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 798509 (2011) https://doi.org/10.1117/12.885420
Proceedings Volume 27th European Mask and Lithography Conference, 79850A (2011) https://doi.org/10.1117/12.896913
Rainer Lebert, Azadeh Farahzadi, Wolfgang Diete, David Schäfer, Christoph Phiesel, Thomas Wilhein, Stefan Herbert, Aleksey Maryasov, Larissa Juschkin, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 79850B (2011) https://doi.org/10.1117/12.896266
Aleksey Maryasov, Stefan Herbert, Larissa Juschkin, Rainer Lebert, Klaus Bergmann
Proceedings Volume 27th European Mask and Lithography Conference, 79850C (2011) https://doi.org/10.1117/12.896890
Metrology
Dirk Beyer, Norbert Rosenkranz, Carola Blaesing-Bangert
Proceedings Volume 27th European Mask and Lithography Conference, 79850D (2011) https://doi.org/10.1117/12.896892
D. Seidel, M. Arnz, D. Beyer
Proceedings Volume 27th European Mask and Lithography Conference, 79850E (2011) https://doi.org/10.1117/12.896899
K.-D. Roeth, O. Loeffler, J. Richter, A. Wiswesser, F. Laske, D. Adam, M. Ferber
Proceedings Volume 27th European Mask and Lithography Conference, 79850F (2011) https://doi.org/10.1117/12.883771
Proceedings Volume 27th European Mask and Lithography Conference, 79850G (2011) https://doi.org/10.1117/12.882848
Jos Maas, Martin Ebert, Kaustuve Bhattacharyya, Hugo Cramer, Arthur Becht, Stefan Keij, Reinder Plug, Andreas Fuchs, Michael Kubis, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 79850H (2011) https://doi.org/10.1117/12.896902
Mask Application
Proceedings Volume 27th European Mask and Lithography Conference, 79850I (2011) https://doi.org/10.1117/12.896909
Holger Bald, Rolf Seltmann, Karsten Bubke, Matthias Ruhm, Marc Noot, Dieter Woischke, Paul van Adrichem, Paul Luehrmann
Proceedings Volume 27th European Mask and Lithography Conference, 79850J (2011) https://doi.org/10.1117/12.886120
Ute Buttgereit, Robert Birkner, Erez Graitzer, Avi Cohen, Benedetta Triulzi, Carmelo Romeo
Proceedings Volume 27th European Mask and Lithography Conference, 79850K (2011) https://doi.org/10.1117/12.896910
Rafael Aldana, Venu Vellanki, Wenjin Shao, Ronald Goossens, Zongchang Yu, Xu Xie, Yu Cao, Koen Schreel, Peter Lee, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 79850L (2011) https://doi.org/10.1117/12.882764
Proceedings Volume 27th European Mask and Lithography Conference, 79850M (2011) https://doi.org/10.1117/12.882521
Mask Cleaning and Haze
Uwe Dietze, Peter Dress, Tobias Waehler, Sherjang Singh, Rik Jonckheere, Bart Baudemprez
Proceedings Volume 27th European Mask and Lithography Conference, 79850N (2011) https://doi.org/10.1117/12.896911
L. Dussault, B. Pelissier, F. Dufaye, S. Gough, J. Hamonne, O. Chaix-Pluchery, P. Sergent, M. Tissier
Proceedings Volume 27th European Mask and Lithography Conference, 79850O (2011) https://doi.org/10.1117/12.891050
Pavel Nesladek, Steve Osborne, Thomas Rode
Proceedings Volume 27th European Mask and Lithography Conference, 79850P (2011) https://doi.org/10.1117/12.895198
M. Dobler, M. Rüb, T. Billen
Proceedings Volume 27th European Mask and Lithography Conference, 79850Q (2011) https://doi.org/10.1117/12.895200
Data Prep/RET and Simulation
G. Bouton, B. Connolly, D. Courboin, A. Di Giacomo, F. Gasnier, R. Lallement, D. Parker, M. Pindo, J. C. Richoilley, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 79850R (2011) https://doi.org/10.1117/12.896341
Proceedings Volume 27th European Mask and Lithography Conference, 79850S (2011) https://doi.org/10.1117/12.895205
Proceedings Volume 27th European Mask and Lithography Conference, 79850T (2011) https://doi.org/10.1117/12.891127
EUV Mask II
Sascha Perlitz, Wolfgang Harnisch, Ulrich Strößner, Heiko Feldmann, Dirk Hellweg, Michael Ringel
Proceedings Volume 27th European Mask and Lithography Conference, 79850U (2011) https://doi.org/10.1117/12.895208
Sang Hoon Han, Jihoon Na, Wonil Cho, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho, Dana Bernstein, Eun Young Park, Anoop Sreenath, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 79850V (2011) https://doi.org/10.1117/12.895209
Rik Jonckheere, Dieter Van den Heuvel, Tristan Bret, Thorsten Hofmann, John Magana, Israel Aharonson, Doron Meshulach, Eric Hendrickx, Kurt Ronse
Proceedings Volume 27th European Mask and Lithography Conference, 79850W (2011) https://doi.org/10.1117/12.883854
Natalia Davydova, Eelco van Setten, Robert de Kruif, Dorothe Oorschot, Mircea Dusa, Christian Wagner, Jiong Jiang, Wei Liu, Hoyoung Kang, et al.
Proceedings Volume 27th European Mask and Lithography Conference, 79850X (2011) https://doi.org/10.1117/12.884504
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