Real-time scanning detection system of defects on a photomask by using the light scattering and interference method

Sangon Lee; Byung heon Han; Jae Heung Jo; Hae Sung Wee; Jong Soo Kim

doi:10.1117/12.916430

3 April 2012 Real-time scanning detection system of defects on a photomask by using the light scattering and interference method

Sangon Lee, Byung heon Han, Jae Heung Jo, Hae Sung Wee, Jong Soo Kim

Author Affiliations +

Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 832430 (2012) https://doi.org/10.1117/12.916430
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In the process of lithography for semiconductor devices, the disuse of semiconductor devices is caused by the several hundred nanometer size pollutants generated by photochemical reactions, which is called by the haze. Therefore, the real time visual detection system is needed to inspect hazes before the existence of disuse semiconductor devices. We proposed and experimentally confirmed the concept of the real time scanning detection system for the defect on the photo-mask by interference fringes generated between the light wave scattered by small defect on the photo-mask and the reflected light wave from the rest area of the front surface.

Citation Download Citation

Sangon Lee, Byung heon Han, Jae Heung Jo, Hae Sung Wee, and Jong Soo Kim "Real-time scanning detection system of defects on a photomask by using the light scattering and interference method", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 832430 (3 April 2012); https://doi.org/10.1117/12.916430

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