Research on theoretical analysis of active fluid jet polishing

Tianxiang Sun; Long Sun; Feng Wang; Shunfu Liu

doi:10.1117/12.2009389

16 October 2012 Research on theoretical analysis of active fluid jet polishing

Tianxiang Sun, Long Sun, Feng Wang, Shunfu Liu

Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 84162P (2012) https://doi.org/10.1117/12.2009389
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

This paper presents the principle of active fluid jet polishing for rapid fabrication. By means of the establishing corresponding mathematical model, a proposed method for producing mid or large sized high precision mirror is discussed in detail. After the final process of active fluid jet polishing, the surface figure PV is about 0.09λ(λ=633nm), the RMS is about 1/60λ and surface roughness RMS of single crystal silicon achieves 1nm. The result of experiment testify active fluid jet polishing could get the mirror of high precision and super smooth surface.

Citation Download Citation

Tianxiang Sun, Long Sun, Feng Wang, and Shunfu Liu "Research on theoretical analysis of active fluid jet polishing", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84162P (16 October 2012); https://doi.org/10.1117/12.2009389

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