Hydrogenated amorphous carbon films having embedded nanoparticles deposited by cathodic jet carbon arc technique

O. S. Panwar; . Ishpal; R. K. tripathi; A. K. Srivastava; Sushil Kumar

doi:10.1117/12.924629

15 October 2012 Hydrogenated amorphous carbon films having embedded nanoparticles deposited by cathodic jet carbon arc technique

O. S. Panwar, . Ishpal, R. K. tripathi, A. K. Srivastava, Sushil Kumar

Author Affiliations +

Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 85491M (2012) https://doi.org/10.1117/12.924629
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India

Abstract

This paper reports the formation and properties of hydrogenated amorphous carbon (a-C: H) films having embedded nanoparticles deposited by cathodic jet carbon arc (CJCA) technique in absence of magnetic field. The films have been characterized by XRD, HRTEM, XPS, dark conductivity, activation energy, optical band gap, residual stress, hardness, elastic modulus and plastic index parameter. The properties evaluated of a-C: H films having embedded particles have been compared with that of undoped and nitrogen doped a-C films having embedded nanoparticles deposited by CJCA technique. All the properties of a- C films studied are found to depend on the gaseous environment used during the deposition of the films. These a-C films having embedded nanoparticles act as hard coating materials.

Citation Download Citation

O. S. Panwar, . Ishpal, R. K. tripathi, A. K. Srivastava, and Sushil Kumar "Hydrogenated amorphous carbon films having embedded nanoparticles deposited by cathodic jet carbon arc technique", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 85491M (15 October 2012); https://doi.org/10.1117/12.924629

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