Influence of hole diameter on the average size and quantity distribution of Si nanoparticles

Lizhi Chu; Yu Zong; Zechao Deng; Xuecheng Ding; Hongdong Zhao; Yinglong Wang

doi:10.1117/12.2036952

21 December 2013 Influence of hole diameter on the average size and quantity distribution of Si nanoparticles

Lizhi Chu, Yu Zong, Zechao Deng, Xuecheng Ding, Hongdong Zhao, Yinglong Wang

Proceedings Volume 9047, 2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication; 904707 (2013) https://doi.org/10.1117/12.2036952
Event: International Conference on Optical Instruments and Technology (OIT2013), 2013, Beijing, China

Abstract

The single crystalline Si target with high resistivity was ablated by a XeCl excimer laser (wavelength 308nm) in pure Ar gas under the ambient pressure of 10 Pa. The mask with a 1-10 mm diameter hole in the center was placed at a distance of 1.5 cm to the Si target. The Si nanocrystalline films were systemically deposited on a glass or single crystalline Si substrate placed behind the mask parallelly with a distance of 1.0 cm. The Raman and X-ray diffraction spectra indicate that the films were nanocrystalline. Scanning electron microscope images of the films showed that the diameter of the hole affected on the quantity and distributed range of Si nanoparticles on the substrate. It was obtained that the average size of Si nanoparticles decreasing with the diameter of the hole increasing, the quantity of Si nanoparticles was proportional to the power of 1.5 of the hole diameter. It is the nonlinear dynamic process to lead to the experimental result.

Citation Download Citation

Lizhi Chu, Yu Zong, Zechao Deng, Xuecheng Ding, Hongdong Zhao, and Yinglong Wang "Influence of hole diameter on the average size and quantity distribution of Si nanoparticles", Proc. SPIE 9047, 2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication, 904707 (21 December 2013); https://doi.org/10.1117/12.2036952

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