Paper
2 April 2014 Verification metrology system by using inline reference metrology
Author Affiliations +
Abstract
For robustness improvement of inline metrology tools, we propose inline reference metrology system “Verification Metrology System (VMS)”. This system combines inline metrology tools and non-destructive reference metrology tools. VMS can detect the false alarm error and the not-detectable error caused by measurement robustness decay of inline metrology tools. GI-SAXS was selected as the inline reference metrology tool. GI-SAXS has high robustness capability for under-layer structure changes. VMS with scatterometry and GI-SAXS was evaluated for measurement robustness. The potential to detect metrology system errors was confirmed using VMS. Cost reduction effect of VMS was estimated for the false alarm case. Total cost is obtained as a sum of the false alarm loss and the metrology cost. VMS is effective for total cost reduction with low sampling. And it is important that sampling frequency of reference metrology is optimized based on process qualities.
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Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, and Yuichiro Yamazaki "Verification metrology system by using inline reference metrology", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501L (2 April 2014); https://doi.org/10.1117/12.2048686
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Cited by 1 scholarly publication.
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KEYWORDS
Metrology

Scatterometry

Nondestructive evaluation

Inspection

Scattering

Semiconducting wafers

Silicon

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