Paper
2 May 2014 Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS
Satoshi Takei, Akihiro Oshima, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Tomoko G. Oyama, Takahiro Kozawa, Seiichi Tagawa, Makoto Hanabata
Author Affiliations +
Abstract
This presentation reported an approach of glucose derivatives to resist polymers for eco-friendly optical NEMS and MEMS. The material design concept to use the water-soluble resist material with highly efficient crosslinking, water development, and lower film thickness shrinkage was proposed for green lithography. The lithographic properties due to the glucose derivatives, and the low film thickness shrinkage due to distinctive bulky chemical structure were proposed in the resist material, and then demonstrated to be effective for creating high resolution, excellent patterning dimensional accuracy, and low line edge roughness in EB lithography. Mixing or blending of glucose and cellulose derivatives was a valuable approach to the design of resist formulations for eco-friendly optical NEMS and MEMS.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Satoshi Takei, Akihiro Oshima, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Tomoko G. Oyama, Takahiro Kozawa, Seiichi Tagawa, and Makoto Hanabata "Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS", Proc. SPIE 9130, Micro-Optics 2014, 913011 (2 May 2014); https://doi.org/10.1117/12.2045636
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Lithography

Extreme ultraviolet

Extreme ultraviolet lithography

Photoresist processing

Etching

Nanoelectromechanical systems

Polymers

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