Paper
22 May 2015 Two-dimensional materials for low power and high frequency devices
Brian M. Bersch, Yu-Chuan Lin, Kehao Zhang, Sarah M. Eichfeld, Jacob H. Leach, Robert Metzger, Keith Evans, Joshua A. Robinson
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Abstract
In this paper, we present an overview of the current state-of-the-art in two-dimensional materials beyond graphene, and summarize device performance reported to-date. There is promise for these layered materials to be the foundation of a new area in low power and high frequency electronics, with early reports indicating 10s of gigahertz (GHz) operation without significant optimization of parasitic resistances or capacitances. In addition, we discuss the synthesis of transition metal dichalcogenides and the integration of as-grown material into heterostructures and electronic devices. Finally, we discuss the impact of surface preparation on the integration of dielectrics with MoS2 required to achieve GHz performance.
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Brian M. Bersch, Yu-Chuan Lin, Kehao Zhang, Sarah M. Eichfeld, Jacob H. Leach, Robert Metzger, Keith Evans, and Joshua A. Robinson "Two-dimensional materials for low power and high frequency devices", Proc. SPIE 9467, Micro- and Nanotechnology Sensors, Systems, and Applications VII, 94670T (22 May 2015); https://doi.org/10.1117/12.2177986
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KEYWORDS
Atomic layer deposition

Graphene

Dielectrics

Heterojunctions

Transistors

Field effect transistors

Oxides

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