Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

Satoshi Takei; Naoto Sugino; Takao Kameda; Shinya Nakajima; Makoto Hanabata

doi:10.1117/12.2243401

5 October 2016 Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

Satoshi Takei, Naoto Sugino, Takao Kameda, Shinya Nakajima, Makoto Hanabata

Author Affiliations +

Proceedings Volume 9985, Photomask Technology 2016; 99852C (2016) https://doi.org/10.1117/12.2243401
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

In this paper, we studied a novel approach, UV nanoimprint lithography using glucose-based template with gaspermeable and gaseous adsorption for reduction of air-trapping issue. The air-trapping issue in UV nanoimprint lithography resist is a cause of pattern failure in resist or UV curable materials. The results of 180 nm dense line patterning of UV curable patterning materials containing acetone in UV nanoimprint lithography using glucose-based template with gas-permeable and gaseous adsorption were effected to reduce the pattern failure as compared with that of the poly(dimethylsiloxane) without gas-permeable and gaseous adsorption as the reference. The proposed UV nanoimprint lithography using glucose-based template with gas-permeable and gaseous adsorption is one of the most promising processes ready to be investigated for mass-production of photomask applications.

Citation Download Citation

Satoshi Takei, Naoto Sugino, Takao Kameda, Shinya Nakajima, and Makoto Hanabata "Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue", Proc. SPIE 9985, Photomask Technology 2016, 99852C (5 October 2016); https://doi.org/10.1117/12.2243401

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