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The Bessel beam is a versatile tool for several applications thanks to its propagation-invariant spatial profile. We demonstrate for the first time the possibility of generating high aspect ratio micro-pillars with an ultrafast first-order Bessel beam on a sapphire sample. A single pulse expels matter shaped as a high-aspect ratio pillar. The height can exceed 10 µm with a typical diameter of 500 nm. Importantly, our method does not require milling or deposition of new material. The process is also fast since it requires only a single pulse, and there is no need for sample post-processing.
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