Combining optical and nanoimprint lithography: 2D photomask imaging to produce 3D nanostructures

Bernard C. Kress

doi:10.1117/12.2686219

22 November 2023 Combining optical and nanoimprint lithography: 2D photomask imaging to produce 3D nanostructures

Bernard C. Kress

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Proceedings Volume PC12751, Photomask Technology 2023; PC1275101 (2023) https://doi.org/10.1117/12.2686219
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Optical lithography through photomask imaging has been the workhorse for 2D wafer scale nanostructure production sustaining Moore's law since more than 5 decades. NanoImprint lithography (or soft lithography) has been a great technique to produce arbitrary 3D wafer scale nanostructures since more than 2 decades. Optical lithography is generally limited to 2D nanostructures (gray scale lithography only providing some relief) and nanoimprint lithography is limited by small aspect ratio and relatively conventional nanostructure geometries as well as by the number of replicas a single hard master can provide. Merging the best of both worlds as in non contact 2D optical imaging to produce arbitrary 3D nanostructures could allow industry to move around such limitations. We will review the latest efforts done towards these goals and some potential developments for the next years.

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Bernard C. Kress "Combining optical and nanoimprint lithography: 2D photomask imaging to produce 3D nanostructures", Proc. SPIE PC12751, Photomask Technology 2023, PC1275101 (22 November 2023); https://doi.org/10.1117/12.2686219

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