High NA EUV: progress update and mask impact

Jan van Schoot

doi:10.1117/12.3012436

26 September 2023 High NA EUV: progress update and mask impact

Jan van Schoot

Author Affiliations +

Proceedings Volume PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; PC1291509 (2023) https://doi.org/10.1117/12.3012436
Event: Photomask Japan 2023, 2023, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2023.

Conference Presentation

Citation Download Citation

Jan van Schoot "High NA EUV: progress update and mask impact", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291509 (26 September 2023); https://doi.org/10.1117/12.3012436

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