Presentation
3 October 2024 Direct laser writing of volumetric photonic integrated circuits (VPICs) for optical and quantum computing
Author Affiliations +
Abstract
Here, we present Subsurface Controllable Refractive Index via Beam Exposure (SCRIBE), a direct-write lithographic approach that enables fabrication of low-loss volumetric microscale gradient refractive index lenses, waveguides, and metamaterials. The basis of SCRIBE is multiphoton polymerization inside monomer-filled nanoporous silicon and silica scaffolds. Adjusting the laser exposure during printing enables 3D submicron control of the polymer infilling and thus the refractive index over a range of greater than 0.3 and chromatic dispersion tuning. A Luneburg lens operating at visible wavelengths, achromatic doublets, multicomponent optics, photonic nanojets and subsurface 3D waveguides were all formed. Various optical elements were combined to create the building blocks for volumetric photonic integrated circuits.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul V. Braun "Direct laser writing of volumetric photonic integrated circuits (VPICs) for optical and quantum computing", Proc. SPIE PC13110, Active Photonic Platforms (APP) 2024, PC1311019 (3 October 2024); https://doi.org/10.1117/12.3027353
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KEYWORDS
Integrated optics

Photonic integrated circuits

Multiphoton lithography

Photonic quantum computing

Quantum optics

Refractive index

3D printing

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