Enhancing sustainability in semiconductor manufacturing: energy-efficient optical crosslinking for lithography processes

Elke Caron; Wesley Zanders; Seungjoo Baek; Seonggil Heo; Jelle Vandereyken; Hyo Seon Suh; Douglas J. Guerrero; Andreia Santos; Masahiko Harumoto; Tsuyoshi Mitsuhashi

doi:10.1117/12.3036987

13 November 2024 Enhancing sustainability in semiconductor manufacturing: energy-efficient optical crosslinking for lithography processes

Elke Caron, Wesley Zanders, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas J. Guerrero, Andreia Santos, Masahiko Harumoto, Tsuyoshi Mitsuhashi

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC1321507 (2024) https://doi.org/10.1117/12.3036987
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

A critical challenge in semiconductor manufacturing is the high electricity consumption, especially by lithography tools, which significantly contribute to the industry's environmental impact. For lithography track systems, reducing the energy consumption of hotplate processes is essential due to their high energy demands. This study introduces an innovative, energy-efficient process that offers a viable alternative to conventional thermal crosslinking systems for Spin-On Carbon (SOC) and spin-on glass (SOG) underlayers, which typically require high temperatures for full film densification. The proposed method utilizes an overall-wafer optical exposure system, integrated on SCREEN’s DT-3000 track, to crosslink underlayer materials designed by Brewer Science to cure through light exposure. This paper demonstrates how this optical crosslinking approach can achieve substantial energy savings of 85% for SOC and 60% for SOG, while maintaining lithographic performance. The transition from a traditional hotplate process to a light-curing mechanism is thoroughly examined from multiple perspectives.

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Elke Caron, Wesley Zanders, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas J. Guerrero, Andreia Santos, Masahiko Harumoto, and Tsuyoshi Mitsuhashi "Enhancing sustainability in semiconductor manufacturing: energy-efficient optical crosslinking for lithography processes", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC1321507 (13 November 2024); https://doi.org/10.1117/12.3036987

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KEYWORDS

Lithography

Semiconductor manufacturing

Sustainability

Optics manufacturing

Carbon

Industry

Power consumption

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