Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography

Prateek Mehrotra; Charles W. Holzwarth; Richard J. Blaikie

doi:10.1117/1.3624516

1 July 2011 Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography

Prateek Mehrotra, Charles W. Holzwarth, Richard J. Blaikie

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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 3, 033012 (July 2011). https://doi.org/10.1117/1.3624516

Abstract

Evanescent-wave imaging is demonstrated using solid-immersion Lloyd's mirror interference lithography at λ = 325 nm to produce 44-nm half-pitch structures (numerical aperture, NA = 1.85). At such an ultrahigh NA the image depth is severely compromised due to the evanescent nature of the exposure, and the use of reflections from plasmonic underlayers is discussed as a possible solution. Simulations and modeling show that image depths in excess of 100 nm should be possible with such a system, using silver as the plasmonic material. The concept is scalable to 193 nm illumination using aluminium as the plasmonic reflector, and simulation results are shown for 26-nm half-pitch imaging into a 37-nm thick resist layer using this scheme.

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Prateek Mehrotra, Charles W. Holzwarth, and Richard J. Blaikie "Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(3), 033012 (1 July 2011). https://doi.org/10.1117/1.3624516

Published: 1 July 2011

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