Debris transport analysis at the intermediate focus of an extreme ultraviolet light source

John Sporre; David N. Ruzic

doi:10.1117/1.JMM.11.2.021117

31 May 2012 Debris transport analysis at the intermediate focus of an extreme ultraviolet light source

John Sporre, David N. Ruzic

Author Affiliations +

Funded by: U.S. Department of Energy, U. S. Department of Energy

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 021117 (May 2012). https://doi.org/10.1117/1.JMM.11.2.021117

Abstract

As extreme ultraviolet light lithography matures, critical deficits in the technology are being resolved. Research has largely focused on solving the debris issue caused by using warm (Te ∼ 30 eV) and dense (ne ∼ 1020 cm−3) plasma to create 13.5-nm light. This research has been largely focused on the mitigation of the debris between the plasma and the collector optics. The next step of debris mitigation is investigated, namely the effect of debris mitigation on the transport of undesired contaminants to the intermediate focus (IF). In order to investigate emissions from the IF, the Center for Plasma-Material Interactions at the University of Illinois at Urbana-Champaign has developed the Sn intermediate focus flux emission detector. The effects of a secondary RF-plasma, buffer gas flow rate, chamber pressure, and charged plate deflection are investigated. By increasing the chamber pressure to 10 mTorr, flowing 1000 sccm Ar buffer gas, and utilizing charged particle deflection, it is possible to reduce the measured number of post-IF species by greater than 99%. Furthermore, it is shown that typical debris mitigation techniques lead to the development of a plasma near the IF that can be detrimental to post-IF optics.

Citation Download Citation

John Sporre and David N. Ruzic "Debris transport analysis at the intermediate focus of an extreme ultraviolet light source," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021117 (31 May 2012). https://doi.org/10.1117/1.JMM.11.2.021117

Published: 31 May 2012

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE