Optimizing the response time of Ni-based resistive temperature detectors

Deok Su Kim; Kyo Sang Choi; Hee Jun Yang; Min Soo Ryu; Ji Sung Chae; Sung Pil Chang

doi:10.1117/1.JMM.14.2.025002

18 May 2015 Optimizing the response time of Ni-based resistive temperature detectors

Deok Su Kim, Kyo Sang Choi, Hee Jun Yang, Min Soo Ryu, Ji Sung Chae, Sung Pil Chang

Author Affiliations +

Funded by: Ministry of Education, National Research Foundation of Korea (NRF)

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 2, 025002 (May 2015). https://doi.org/10.1117/1.JMM.14.2.025002

Abstract

Resistive temperature detectors (RTDs) are widely used to monitor and control the temperature of work environments due to their higher sensitivity, excellent reliability and stability, and very linear output signal compared to other types of temperature detectors. However, RTDs have some shortcomings, including a slow response time. A nickel-based RTDs were designed, fabricated, and characterized in order to achieve faster response times. We used micromachining processes to analyze devices with different resistor thicknesses, distances between resistor lines, and resistor line widths. The response times of the RTDs were measured to be between 7.5104 and 23.4583 s. From these measurement data, we can conclude that thinner RTDs with larger surface areas show improved response times.

Citation Download Citation

Deok Su Kim, Kyo Sang Choi, Hee Jun Yang, Min Soo Ryu, Ji Sung Chae, and Sung Pil Chang "Optimizing the response time of Ni-based resistive temperature detectors," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(2), 025002 (18 May 2015). https://doi.org/10.1117/1.JMM.14.2.025002

Published: 18 May 2015

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