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7 July 2015 Control of polystyrene-block-poly(methyl methacrylate) directed self-assembly by laser-induced millisecond thermal annealing
Alan G. Jacobs, Byungki Jung, Jing Jiang, Christopher K. Ober, Michael O. Thompson
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Funded by: National Science Foundation
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 3, 031205 (July 2015). https://doi.org/10.1117/1.JMM.14.3.031205
Abstract
Directed self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) during laser thermal annealing at peak temperatures of 300°C–800°C for dwells of 1–10 ms has been explored. The enhanced mobility of polymer chains at these temperatures improves registration compared with conventional thermal anneals. PS-b-PMMA films (forming 15-nm line/space standing lamellae) were cast on chemically patterned substrates with a copolymer neutral layer and annealed by laser and hot plate. Annealing by hot plate or multiple laser scans resulted in well-aligned features over micron length scales. By laser annealing multiple times, defectivity was reduced by ∼60%. However, laser annealing for only 10 ms before performing a hot plate anneal reduced defectivity by <80%. We believe that this reduction arises from improved interfacial alignment of the film to the template during laser annealing near the order–disorder transition.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2015/$25.00 © 2015 SPIE
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Alan G. Jacobs, Byungki Jung, Jing Jiang, Christopher K. Ober, and Michael O. Thompson "Control of polystyrene-block-poly(methyl methacrylate) directed self-assembly by laser-induced millisecond thermal annealing," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(3), 031205 (7 July 2015). https://doi.org/10.1117/1.JMM.14.3.031205
Published: 7 July 2015
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KEYWORDS
Annealing
Directed self assembly
Polymers
Scanning electron microscopy
Gas lasers
Plasma etching
Polymer thin films
CHORUS Article. This article was made freely available starting 06 July 2016
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