Sustained polymer membranes fabricated by nanoimprint lithography

Helmut Schift; Sandro Bellini; Uwe Pieles; Jens Gobrecht

doi:10.1117/1.2172993

1 January 2006 Sustained polymer membranes fabricated by nanoimprint lithography

Helmut Schift, Sandro Bellini, Uwe Pieles, Jens Gobrecht

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 5, Issue 1, 011010 (January 2006). https://doi.org/10.1117/1.2172993

Abstract

Perforated polymer membranes are fabricated using nanoimprint lithography and a sacrificial layer technique. The membranes with micrometer-sized pores are partially released from the substrate by locally dissolving the underlying layer. Thus, large arrays with interconnected pores can be fabricated. This process can be applied to a wide selection of polymeric materials, and has the potential to be extended to submicrostructures.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Helmut Schift, Sandro Bellini, Uwe Pieles, and Jens Gobrecht "Sustained polymer membranes fabricated by nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 011010 (1 January 2006). https://doi.org/10.1117/1.2172993

Published: 1 January 2006

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