18 November 2016 Accurate lithography hotspot detection using deep convolutional neural networks
Moojoon Shin, Jee-Hyong Lee
Author Affiliations +
Funded by: National Research Foundation of Korea (NRF)
Abstract
As the physical design of semiconductors continues to shrink, the lithography process is becoming more sensitive to layout design. Identifying lithography hotspots (HSs) in the layout design stage appears to be more and more crucial for fast semiconductor development. In this direction, we propose an accurate HS detection method using convolutional neural networks. Our approach produces more accurate detection performance (95.5% recall and 22.2% precision) compared to previous approaches. In spite of the use of deep convolutional neural networks, our method achieves a fast detection time of 0.72  h/mm2. In order to quickly and accurately detect HSs, we not only utilize the nature of convolutional-neural networks but also make additional technical efforts to improve the performance of our framework, including inspection region reduction, data augmentation, DBSCAN clustering, modified batch normalization, and fast image scanning. To the best of our knowledge, our approach is the first CNN-based lithography HS detection.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2016/$25.00 © 2016 SPIE
Moojoon Shin and Jee-Hyong Lee "Accurate lithography hotspot detection using deep convolutional neural networks," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(4), 043507 (18 November 2016). https://doi.org/10.1117/1.JMM.15.4.043507
Published: 18 November 2016
Lens.org Logo
CITATIONS
Cited by 62 scholarly publications and 6 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lithography

Inspection

Convolutional neural networks

Machine learning

Convolution

Feature extraction

Data modeling

Back to Top