Editorial
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 040101, (October 2023) https://doi.org/10.1117/1.JMM.22.4.040101
Open Access
TOPICS: Lithography, Printing, Photomasks, Photomask technology, Mask making, Extreme ultraviolet lithography, Reticles, Optical lithography, Manufacturing, Integrated circuits
JM3 Letters
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 040501, (November 2023) https://doi.org/10.1117/1.JMM.22.4.040501
TOPICS: Photoresist materials, Image resolution, Electric fields, Absorption, Extreme ultraviolet, Reflection, Standing waves, Lithography, Light absorption, Refraction
Special Section on Direct Write Lithography
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041401, (December 2023) https://doi.org/10.1117/1.JMM.22.4.041401
Open Access
TOPICS: Direct write lithography, Electron beam direct write lithography, Semiconducting wafers, Lithography, Photomasks, Vestigial sideband modulation, Semiconductors, Wafer level optics, Universities, Soldiers
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041402, (June 2023) https://doi.org/10.1117/1.JMM.22.4.041402
Open Access
TOPICS: Spatial light modulators, Semiconducting wafers, Micromirrors, Optics manufacturing, Semiconductor manufacturing, Silicon, Digital micromirror devices, Wafer-level optics, Pulsed laser operation, Projection systems
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/1.JMM.22.4.041403
TOPICS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing
Fabien Laulagnet, Jacques-Alexandre Dallery, Laurent Pain, Michael May, Béatrice Hémard, Franck Garlet, Isabelle Servin, Chiara Sabbione
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041404, (June 2023) https://doi.org/10.1117/1.JMM.22.4.041404
TOPICS: Electron beam direct write lithography, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Optical alignment, Photoresist processing, Design and modelling, Overlay metrology, Silicon
Uwe Zeitner, Michael Banasch, Marcus Trost
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041405, (June 2023) https://doi.org/10.1117/1.JMM.22.4.041405
Open Access
TOPICS: Electron beam lithography, Computer generated holography, Lithography, Vestigial sideband modulation, Optical gratings, Nanostructures, Fabrication, Diffraction, Axicons, Optical components
Eike Linn, Stefan Fasold, Ines Stolberg, Ulf Weidenmueller
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041406, (July 2023) https://doi.org/10.1117/1.JMM.22.4.041406
TOPICS: Optical gratings, Axicons, Air contamination, Vestigial sideband modulation, Scanning electron microscopy, Design and modelling, Optical components, Edge roughness, Electron beams, Electron beam lithography
Guido de Boer
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041407, (December 2023) https://doi.org/10.1117/1.JMM.22.4.041407
TOPICS: Semiconducting wafers, Electron beam lithography, Lithography, Electron beams, Wafer level optics, Reticles, Switching, Switches, Line width roughness, Light sources and illumination
Special Section on Plasma Modeling and Feature Profile Simulation
Catherine Labelle, Mark Kushner
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041501, (December 2023) https://doi.org/10.1117/1.JMM.22.4.041501
Open Access
TOPICS: Plasma, Modeling, Computer simulations, Systems modeling, Process modeling, Microelectronics, Machine learning, Design, Vacuum chambers, Semiconductor manufacturing
Nobuyuki Kuboi
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041502, (November 2023) https://doi.org/10.1117/1.JMM.22.4.041502
TOPICS: Etching, Silicon, Ions, Plasma, Modeling, 3D modeling, Atomic layer etching, Argon, Chlorine, Voxels
Shahid Rauf, Kallol Bera, Jason Kenney, Prashanth Kothnur
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041503, (November 2023) https://doi.org/10.1117/1.JMM.22.4.041503
TOPICS: Plasma, Modeling, Ions, Systems modeling, Process modeling, Industry, Photonic integrated circuits, Semiconductors, Monte Carlo methods, Chemistry
Jan Trieschmann, Luca Vialetto, Tobias Gergs
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041504, (December 2023) https://doi.org/10.1117/1.JMM.22.4.041504
Open Access
TOPICS: Plasma, Modeling, Data modeling, Education and training, Artificial neural networks, Machine learning, Chemistry, Ions, Systems modeling, Monte Carlo methods
Special Section on Control of Integrated Circuit Patterning Variance, Part 5: Pattern Placement, Critical Dimension, and Edge-to-Edge Overlay
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041601, (December 2023) https://doi.org/10.1117/1.JMM.22.4.041601
Open Access
TOPICS: Electron beam lithography, Overlay metrology, Integrated circuits, Metrology, Lithography, Dimensional metrology, Scanning electron microscopy, Process control, Optical proximity correction, Inspection
Andrzej Strojwas, Tomasz Brozek, Indranil De
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041602, (October 2023) https://doi.org/10.1117/1.JMM.22.4.041602
TOPICS: Metrology, Semiconducting wafers, Design, Optical lithography, Metals, Inspection, Etching, Line width roughness, Critical dimension metrology, Design rules
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/1.JMM.22.4.041603
TOPICS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling
Victor Blanco Carballo, Etienne De Poortere, Philippe Leray, Dorin Cerbu, Jeroen van de Kerkhove, Nicola Kissoon
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041604, (October 2023) https://doi.org/10.1117/1.JMM.22.4.041604
TOPICS: Metals, Design rules, Design, Critical dimension metrology, Scanning electron microscopy, Diffractive optical elements, Extreme ultraviolet, Etching, Optical lithography, Transmission electron microscopy
Muneyuki Fukuda, Kazuhisa Hasumi, Takashi Nobuhara, Hirohiko Kitsuki, Zhigang Wang, Kazuhiro Nojima, Yusaku Suzuki, Akira Hamaguchi, Masashi Kubo, Masaya Hosokawa
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041605, (October 2023) https://doi.org/10.1117/1.JMM.22.4.041605
Open Access
TOPICS: Modulation, Electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electrical properties, Inspection, Defect detection, Scanning probe microscopy, Manufacturing, Defect inspection
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 041606, (December 2023) https://doi.org/10.1117/1.JMM.22.4.041606
TOPICS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Optical lithography, Machine learning, Extreme ultraviolet, Semiconducting wafers, Education and training, Industry, Source mask optimization
Alternative lithographic technologies
Tao Zhang, Hengyu Zhou, Shisheng Xiong, Sikun Li
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 043001, (December 2023) https://doi.org/10.1117/1.JMM.22.4.043001
TOPICS: Directed self assembly, Lithography, Optical lithography, Electron beam lithography, Block copolymers, Mathematical optimization, Design, Printing, Manufacturing, Very large scale integration
Computational lithography and resolution enhancement techniques
Jiashuo Wang, Lisong Dong, Xiaojing Su, Yajuan Su, Xu Ma, Yayi Wei
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 043201, (October 2023) https://doi.org/10.1117/1.JMM.22.4.043201
TOPICS: Calibration, Matrices, Amplifiers, Photoresist processing, Light sources and illumination, Diffraction, Semiconducting wafers, Lithography, Quenching, Process modeling
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 043202, (November 2023) https://doi.org/10.1117/1.JMM.22.4.043202
TOPICS: Nanoimprint lithography, Extreme ultraviolet, Polarization, Polarizers, Extreme ultraviolet lithography, Light sources and illumination, 3D mask effects, Diffraction, 3D modeling, Polarized light
Metrology
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 044001, (November 2023) https://doi.org/10.1117/1.JMM.22.4.044001
TOPICS: Line width roughness, Fourier transforms, Critical dimension metrology, Metrology, Signal to noise ratio, Film thickness, Extreme ultraviolet lithography, Scanning electron microscopy, Photoresist processing, Image analysis
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 044002, (December 2023) https://doi.org/10.1117/1.JMM.22.4.044002
TOPICS: Shrinkage, Photoresist materials, Line edge roughness, Scanning electron microscopy, Atomic force microscopy, 3D metrology, Lithography, Metrology, Fractal analysis, Electron beams
Process control
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 044801, (October 2023) https://doi.org/10.1117/1.JMM.22.4.044801
TOPICS: Line edge roughness, Extreme ultraviolet lithography, Semiconducting wafers, Nanoimprint lithography, Light sources and illumination, Photoresist processing, Stochastic processes, Extreme ultraviolet, Scanners, Fourier transforms
Errata
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 22, Issue 04, 049801, (December 2023) https://doi.org/10.1117/1.JMM.22.4.049801
Open Access
TOPICS: 3D image processing
Back to Top