Deposition optimization of W/C multilayer mirrors

Alan F. Jankowski

doi:10.1117/12.55683

1 August 1990 Deposition optimization of W/C multilayer mirrors

Alan F. Jankowski

Author Affiliations +

Optical Engineering, Vol. 29, Issue 8, (August 1990). https://doi.org/10.1117/12.55683

Abstract

The reflectivity of grazing incidence W/C multilayer mirrors can be optimized by progressively refining structural features through sputter deposition parameter optimization. In addition to the configuration of system geometry, the deposition rate, substrate temperature, and working gas pressure significantly affect the multilayer structure morphology. Of these parameters, working gas pressure has an overwhelming effect. The energy and distribution of sputtered adatoms, directly influenced by the sputtering gas pressure, affects the reactivity at and the reconstruction of vapor deposited surfaces. The interface abruptness is therefore affected by working gas pressure. The reduction in interfacial atomic intermixing (hence roughness) generally follows with decreased working gas pressure. Correspondingly, the improved reflective efficiency becomes more noticeable as measured from short through long x-ray wavelengths. Structural and reflectivity improvements in the W/C multilayer mirror system, characterized qualitatively using cross-section electron microscopy and quantitatively using x-ray diffraction, will be correlated to an optimization of the sputter deposition parameter—working gas pressure.

Citation Download Citation

Alan F. Jankowski "Deposition optimization of W/C multilayer mirrors," Optical Engineering 29(8), (1 August 1990). https://doi.org/10.1117/12.55683

Published: 1 August 1990

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