Optical interconnection with phase-only masks by means of reactive ion etching

JingJuan Zhang; Chao Xu; Shiping Gao

doi:10.1117/12.143723

1 August 1993 Optical interconnection with phase-only masks by means of reactive ion etching

JingJuan Zhang, Chao Xu, Shiping Gao

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Optical Engineering, Vol. 32, Issue 8, (August 1993). https://doi.org/10.1117/12.143723

Abstract

The calculation results in a one-dimensional (1-D) interconnection system are proposed. The method of preparing phase-only masks with reactive ion etching is introduced. The masks are applied to a 1-D interconnection experiment. The experimental results are consistent with the theory.

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JingJuan Zhang, Chao Xu, and Shiping Gao "Optical interconnection with phase-only masks by means of reactive ion etching," Optical Engineering 32(8), (1 August 1993). https://doi.org/10.1117/12.143723

Published: 1 August 1993

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