Process techniques for improving performance of positive tone silylation

Edward K. Pavelchek; Gary S. Calabrese; John F. Bohland; Bruce W. Dudley; Susan K. Jones; Peter W. Freeman

doi:10.1117/12.146858

1 October 1993 Process techniques for improving performance of positive tone silylation

Edward K. Pavelchek, Gary S. Calabrese, John F. Bohland, Bruce W. Dudley, Susan K. Jones, Peter W. Freeman

Author Affiliations +

Optical Engineering, Vol. 32, Issue 10, (October 1993). https://doi.org/10.1117/12.146858

Abstract

Two approaches that control the overflow of silylated material that can occur subsequent to surface imaging of acid-hardened resists are introduced. Treatment of the resist surface with a cross-linking agent [bis(dimethylamino)dimethylsilane] prior to silylation can produce a surface layer with the physical integrity to constrain silylated material. Alternatively, the unexposed areas of the resist may be partially removed by development with a basic solution. The surface depressions thus produced allow volume expansion to occur during silylation without causing overflow.

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Edward K. Pavelchek, Gary S. Calabrese, John F. Bohland, Bruce W. Dudley, Susan K. Jones, and Peter W. Freeman "Process techniques for improving performance of positive tone silylation," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.146858

Published: 1 October 1993

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