Low-absorption measurements of optical thin films at 10.6 microns

Jean DiJon; Erik Duloisy; Philippe Lyan

doi:10.1117/12.147717

1 November 1993 Low-absorption measurements of optical thin films at 10.6 microns

Jean DiJon, Erik Duloisy, Philippe Lyan

Author Affiliations +

Optical Engineering, Vol. 32, Issue 11, (November 1993). https://doi.org/10.1117/12.147717

Abstract

We present new data analysis of photothermal measurements to extract the extinction coefficient k of thin films or bare substrates at 10.6 μm. We show how to obtain k by means of analytical formulation, with substrate absorption taken into account, and how to minimize experimental errors. Then, we discuss accuracy and reliability for substrates, thin films, and mirrors. Results are given for k values as low as 10^-4 for thin films and 10^-8 for substrates. Mirror reflectivities higher than 99.8% were measured

Citation Download Citation

Jean DiJon, Erik Duloisy, and Philippe Lyan "Low-absorption measurements of optical thin films at 10.6 microns," Optical Engineering 32(11), (1 November 1993). https://doi.org/10.1117/12.147717

Published: 1 November 1993

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE