Antireflection-coated diffractive optical elements fabricated by thin-film deposition

Edgar Pawlowski; Berndt Kuhlow

doi:10.1117/12.179893

1 November 1994 Antireflection-coated diffractive optical elements fabricated by thin-film deposition

Edgar Pawlowski, Berndt Kuhlow

Author Affiliations +

Optical Engineering, Vol. 33, Issue 11, (November 1994). https://doi.org/10.1117/12.179893

Abstract

The use of thin-film deposition in the fabrication of antireflection-coated diffractive optical elements is discussed. The antireflection coatings for these diffractive elements are optimized on the basis of an angular spectrum approach and the method of characteristic matrices. A minimum reflectivity as low as 1 x 10^-4 is realized using in situ controlled multilayers of TiO₂ and SiO₂. The blazed profile of the diftractive optical elements is approximated by a stepped profile with up to 32 phase levels. The highest measured diffraction efficiency for 32-level Fresnel zone lenses was 97%.

Citation Download Citation

Edgar Pawlowski and Berndt Kuhlow "Antireflection-coated diffractive optical elements fabricated by thin-film deposition," Optical Engineering 33(11), (1 November 1994). https://doi.org/10.1117/12.179893

Published: 1 November 1994

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