Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park; Justin M. Sierchio; Melissa A. Zaverton; Youngsik Kim; Thomas D. Milster

doi:10.1117/1.OE.51.2.023401

23 February 2012 Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park, Justin M. Sierchio, Melissa A. Zaverton, Youngsik Kim, Thomas D. Milster

Author Affiliations +

Optical Engineering, Vol. 51, Issue 2, 023401 (February 2012). https://doi.org/10.1117/1.OE.51.2.023401

Abstract

We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.

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Jong Rak Park, Justin M. Sierchio, Melissa A. Zaverton, Youngsik Kim, and Thomas D. Milster "Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements," Optical Engineering 51(2), 023401 (23 February 2012). https://doi.org/10.1117/1.OE.51.2.023401

Published: 23 February 2012

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