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24 May 2019 Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range
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Abstract
Reflection losses due to refractive index mismatch limit the obtainable diffraction efficiencies for transmission gratings in the highly dispersive regime, i.e., with period to wavelength ratios smaller than 0.7. The design and fabrication of such gratings with high-diffraction efficiencies (≥94  %  , Littrow configuration) will be discussed with an emphasis on process strategies to control the profiles in the reactive ion beam etching step. Experimental results from the manufacturing of monolithic fused silica pulse compression gratings with 3000  L  /  mm optimized for a center wavelength of 519 nm will be presented. The influence of different etching parameters such as etch gas mixture, ion incidence angle, and acceleration voltage of the ion source on profile depth, side-wall angle, duty cycle, and ultimately diffraction efficiencies will be discussed.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Annemarie Finzel, Felix Koch, Gregor Dornberg, Dennis Lehr, Frank Frost, and Tilman Glaser "Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range," Optical Engineering 58(9), 092614 (24 May 2019). https://doi.org/10.1117/1.OE.58.9.092614
Received: 1 February 2019; Accepted: 30 April 2019; Published: 24 May 2019
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Etching

Diffraction gratings

Ions

Diffraction

Ion beams

Reactive ion etching

Refractive index

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