Paper
16 April 1993 Effects of H2O on atomic hydrogen generation in hydrogen plasma
Jun Kikuchi, Masafumi Suzuki, Hiroshi Yano, Shuzo Fujimura
Author Affiliations +
Proceedings Volume 1803, Advanced Techniques for Integrated Circuit Processing II; (1993) https://doi.org/10.1117/12.142937
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States
Abstract
Water vapor added hydrogen gas is discharged by microwave. Concentrations of hydrogen atoms are measured in the plasma by actinometry and in the downstream by electron spin resonance (ESR). When water vapor is added to hydrogen gas, the concentration of hydrogen atoms in the plasma increases to an amount three times greater than that of pure hydrogen gas and the concentration in the downstream increases to an amount 90 times greater. When hydrogen gas without water vapor is discharged, the concentration of hydrogen atoms decreases just after the discharge is turned on. When water vapor is added to hydrogen gas, however, this time dependence of hydrogen concentration is not observed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Kikuchi, Masafumi Suzuki, Hiroshi Yano, and Shuzo Fujimura "Effects of H2O on atomic hydrogen generation in hydrogen plasma", Proc. SPIE 1803, Advanced Techniques for Integrated Circuit Processing II, (16 April 1993); https://doi.org/10.1117/12.142937
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Cited by 2 scholarly publications.
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KEYWORDS
Hydrogen

Chemical species

Plasma

Quartz

Microwave radiation

Oxygen

Molecules

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