Toward a unified advanced CD-SEM specification for sub-0.18-um technology

John A. Allgair; Charles N. Archie; G. William Banke Jr.; E. Hal Bogardus; Joseph E. Griffith; Herschel M. Marchman; Michael T. Postek Jr.; Lumdas H. Saraf; Jerry E. Schlesinger; Bhanwar Singh; Neal T. Sullivan; Lee E. Trimble; Andras E. Vladar; Arnold W. Yanof

doi:10.1117/12.308724

8 June 1998 Toward a unified advanced CD-SEM specification for sub-0.18-μm technology

John A. Allgair, Charles N. Archie, G. William Banke Jr., E. Hal Bogardus, Joseph E. Griffith, Herschel M. Marchman, Michael T. Postek Jr., Lumdas H. Saraf, Jerry E. Schlesinger, Bhanwar Singh, Neal T. Sullivan, Lee E. Trimble, Andras E. Vladar, Arnold W. Yanof

Author Affiliations +

Proceedings Volume 3332, Metrology, Inspection, and Process Control for Microlithography XII; (1998) https://doi.org/10.1117/12.308724
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The stringent critical dimension control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope specification in the interests of providing a unified criterion of performance and testing. The specification is grounded on standard definitions and strong principles of metrology. The current revision is to be published as a SEMATECH document. A new revision, now in progress, will embody the consensus of a vendor/user conference.

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John A. Allgair, Charles N. Archie, G. William Banke Jr., E. Hal Bogardus, Joseph E. Griffith, Herschel M. Marchman, Michael T. Postek Jr., Lumdas H. Saraf, Jerry E. Schlesinger, Bhanwar Singh, Neal T. Sullivan, Lee E. Trimble, Andras E. Vladar, and Arnold W. Yanof "Toward a unified advanced CD-SEM specification for sub-0.18-μm technology", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308724

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