How to match without copying: an approach for APSM mask process matching using aerial imaging

M. Sczyrba; C. Romeo; F. Schurack; T. Castro; B. Connolly

doi:10.1117/12.865236

24 September 2010 How to match without copying: an approach for APSM mask process matching using aerial imaging

M. Sczyrba, C. Romeo, F. Schurack, T. Castro, B. Connolly

Proceedings Volume 7823, Photomask Technology 2010; 78231Z (2010) https://doi.org/10.1117/12.865236
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

For mask signature matching in the case of alternating phase-shifting mask it is shown that it is can be achieved using matching of aerial imaging. This is in contrast to the traditional approach of manufacturing an identical copy of the reference mask. Beside description of the method AIMS and wafer data are shown that proof its successful application on a product mask.

Citation Download Citation

M. Sczyrba, C. Romeo, F. Schurack, T. Castro, and B. Connolly "How to match without copying: an approach for APSM mask process matching using aerial imaging", Proc. SPIE 7823, Photomask Technology 2010, 78231Z (24 September 2010); https://doi.org/10.1117/12.865236

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